Review on Order-Disorder Behavior in Oxide Interfaces Published in COSSMS

My critical review on order-disorder behavior at thin film oxide interfaces has just been published in Current Opinion in Solid State and Materials Science! In this review, I discuss the present understanding of the emergence of order during oxide synthesis, as well as disordering processes during irradiation. I also highlight emerging areas of research to help guide future efforts to understand these important phenomena, which impact the performance of materials for a range of applications. The article is part of a special issue on “Recent advances in the understanding of the structure and dynamics of complex oxides,” organized by Blas Uberuaga and Cortney Kreller (Los Alamos National Laboratory) and Maik Lang (University of Tennessee–Knoxville).

From the abstract:

Order-disorder processes fundamentally determine the structure and properties of many important oxide systems for energy and computing applications. While these processes have been intensively studied in bulk materials, they are less investigated and understood for nanostructured oxides in highly non- equilibrium conditions. These systems can now be realized through a range of deposition techniques and probed at exceptional spatial and chemical resolution, leading to a greater focus on interface dynamics. Here we survey a selection of recent studies of order-disorder behavior at thin film oxide interfaces, with a particular emphasis on the emergence of order during synthesis and disorder in extreme irradiation environments. We summarize key trends and identify directions for future study in this growing research area.

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